v0.8 Release Notes
Main Focus
v0.8 extends the fixed-ROI optical review from a single normalized condition to a physical focus/dose process-window workflow. The existing fast preview remains available, while an optional sweep evaluates one fixed candidate over bounded focus and relative-dose grids.
Focus and Dose Model
The scalar, aberration-free Abbe pupil now accepts wafer-side focus_um and
propagates the corresponding defocus phase. Dose remains a resist-side
threshold operation:
effective threshold = nominal threshold / relative dose
The raw aerial image is therefore not rescaled for each dose. The process-window path uses clear-field-relative intensity, while the legacy single-condition preview keeps its display-oriented peak normalization. This separation avoids mixing a visualization convention with physical sweep measurements.
Process-Window Analysis
The optional workflow adds:
- fixed-candidate focus/dose sweeps
- dose-to-size calibration at best focus
- explicit no-contour and topology-failure states
- sampled depth-of-focus and exposure-latitude summaries
- common process-window counts
- Bossung and process-window plots
- CSV and JSON result artifacts
- bounded UI controls for focus, dose, and candidate condition counts
Mask FFT and source-independent context are reused across focus conditions.
The process-window path defaults to dense11 source quadrature; the fast
single-condition preview remains on dense7.
Validation
The implementation added checks for focus-sign symmetry, through-focus clear-field conservation, inverse-dose threshold behavior, topology failures, common-PW summaries, and service integration. All 47 automated tests passed at the v0.8 implementation milestone.
Interpretation Limits
The sweep is a sampled, simplified-model process-window analysis. It is not a scanner-calibrated resist or wafer prediction. A PASS cell describes the configured contour/CD criteria on the sampled grid only.