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v0.8 Release Notes

Main Focus

v0.8 extends the fixed-ROI optical review from a single normalized condition to a physical focus/dose process-window workflow. The existing fast preview remains available, while an optional sweep evaluates one fixed candidate over bounded focus and relative-dose grids.

Focus and Dose Model

The scalar, aberration-free Abbe pupil now accepts wafer-side focus_um and propagates the corresponding defocus phase. Dose remains a resist-side threshold operation:

effective threshold = nominal threshold / relative dose

The raw aerial image is therefore not rescaled for each dose. The process-window path uses clear-field-relative intensity, while the legacy single-condition preview keeps its display-oriented peak normalization. This separation avoids mixing a visualization convention with physical sweep measurements.

Process-Window Analysis

The optional workflow adds:

  • fixed-candidate focus/dose sweeps
  • dose-to-size calibration at best focus
  • explicit no-contour and topology-failure states
  • sampled depth-of-focus and exposure-latitude summaries
  • common process-window counts
  • Bossung and process-window plots
  • CSV and JSON result artifacts
  • bounded UI controls for focus, dose, and candidate condition counts

Mask FFT and source-independent context are reused across focus conditions. The process-window path defaults to dense11 source quadrature; the fast single-condition preview remains on dense7.

Validation

The implementation added checks for focus-sign symmetry, through-focus clear-field conservation, inverse-dose threshold behavior, topology failures, common-PW summaries, and service integration. All 47 automated tests passed at the v0.8 implementation milestone.

Interpretation Limits

The sweep is a sampled, simplified-model process-window analysis. It is not a scanner-calibrated resist or wafer prediction. A PASS cell describes the configured contour/CD criteria on the sampled grid only.